The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2023

Filed:

Feb. 03, 2021
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Rami Khazaka, Leuven, BE;

Lucas Petersen Barbosa Lima, Heverlee, BE;

Qi Xie, Wilsele, BE;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 31/10 (2006.01); C30B 29/06 (2006.01); C30B 23/00 (2006.01); C30B 31/18 (2006.01); C30B 23/02 (2006.01);
U.S. Cl.
CPC ...
C30B 29/06 (2013.01); C30B 23/005 (2013.01); C30B 23/025 (2013.01); C30B 31/10 (2013.01); C30B 31/18 (2013.01);
Abstract

Methods and devices for low-temperature deposition of phosphorous-doped silicon layers. Disilane is used as a silicon precursor, and nitrogen or a noble gas is used as a carrier gas. Phosphine is a suitable phosphorous precursor.


Find Patent Forward Citations

Loading…