The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2023
Filed:
Dec. 11, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Huiyuan Wang, Santa Clara, CA (US);
Susmit Singha Roy, Sunnyvale, CA (US);
Takehito Koshizawa, San Jose, CA (US);
Bo Qi, San Jose, CA (US);
Abhijit Basu Mallick, Palo Alto, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); H01L 21/768 (2006.01); H01L 21/311 (2006.01); C23C 16/56 (2006.01); C23C 16/455 (2006.01); H01L 21/762 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/407 (2013.01); C23C 16/45527 (2013.01); C23C 16/56 (2013.01); H01L 21/0228 (2013.01); H01L 21/31111 (2013.01); H01L 21/76224 (2013.01); H01L 21/76837 (2013.01);
Abstract
Methods for forming defect-free gap fill materials comprising germanium oxide are disclosed. In some embodiments, the gap fill material is deposited by exposing a substrate surface to a germane precursor and an oxidant simultaneously. The germane precursor may be flowed intermittently. The substrate may also be exposed to a second oxidant to increase the relative concentration of oxygen within the gap fill material.