The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2023
Filed:
Jun. 08, 2020
Tokyo Electron Limited, Tokyo, JP;
Masatoshi Shiraishi, Kumamoto, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate processing method includes preparing a substrate, forming a plating inhibiting film and forming a plating film. In the preparing of the substrate, the substrate W which has a recessformed on a front surface thereof and a seed layerformed on the front surface and an inner surface of the recess is prepared. In the forming of the plating inhibiting film, the plating inhibiting filmC is formed on an upper portion of the recess. In the forming of the plating film, the plating filmis formed in the recess by bringing the substrate into contact with a plating liquid after the forming of the plating inhibiting film, to thereby fill the recess with the plating film.