The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2023
Filed:
Jul. 30, 2020
Applicant:
Resonac Corporation, Tokyo, JP;
Inventor:
Kotaro Hayashi, Tokyo, JP;
Assignee:
Resonac Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 1/72 (2006.01); C11D 3/24 (2006.01); C11D 3/43 (2006.01); C11D 7/50 (2006.01); C11D 7/28 (2006.01); C11D 7/32 (2006.01); C11D 3/20 (2006.01); C11D 7/26 (2006.01); C11D 3/28 (2006.01); B08B 3/08 (2006.01);
U.S. Cl.
CPC ...
C11D 7/5013 (2013.01); B08B 3/08 (2013.01); C11D 3/2068 (2013.01); C11D 3/28 (2013.01); C11D 7/263 (2013.01); C11D 7/28 (2013.01); C11D 7/32 (2013.01); C11D 7/3209 (2013.01); C11D 7/3281 (2013.01); C11D 7/5022 (2013.01);
Abstract
Provided is a composition which has an excellent affinity with the surface of an adhesive agent and can achieve a high etching rate. The composition according to one embodiment comprises: a quaternary alkylammonium fluoride or a hydrate of a quaternary alkylammonium fluoride; and, as an aprotic solvent, (A) an N-substituted amide compound having no active hydrogen on a nitrogen atom, and (B) a dipropylene glycol dimethyl ether, wherein (B) the dipropylene glycol dimethyl ether has the percentage of a structural isomer represented by formula (1) of at least 50 mass % with respect to the total amount of (B) the dipropylene glycol dimethyl ether.