The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2023

Filed:

Jan. 19, 2021
Applicants:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

National University Corporation Hokkaido University, Hokkaido, JP;

Inventors:

Ken Miyagi, Kawasaki, JP;

Takahiro Dazai, Kawasaki, JP;

Toshifumi Satoh, Hokkaido, JP;

Takuya Isono, Hokkaido, JP;

Shunma Tanaka, Hokkaido, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/02 (2006.01); C08F 299/02 (2006.01); C08L 33/12 (2006.01); C08L 25/08 (2006.01); G03F 7/00 (2006.01); C08F 212/08 (2006.01); C08L 53/00 (2006.01);
U.S. Cl.
CPC ...
C08F 299/024 (2013.01); B05D 3/0254 (2013.01); C08F 212/08 (2013.01); C08L 25/08 (2013.01); C08L 33/12 (2013.01); C08L 53/00 (2013.01); G03F 7/0002 (2013.01);
Abstract

A resin composition for forming a phase-separated structure includes a block copolymer having a block (b1) formed of a repeating structure of styrene units, the block (b1) being partially substituted with a constituent unit represented by the following General Formula (c1) and a block (b2) having a repeating structure of methyl methacrylate units. In the formula, R is a hydrogen atom or a methyl group and Ris a hydrophobic functional group


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