The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2023

Filed:

Dec. 09, 2019
Applicant:

Showa Denko K.k., Tokyo, JP;

Inventors:

Atsushi Suzuki, Tokyo, JP;

Kazuma Matsui, Tokyo, JP;

Assignee:

Resonac Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/14 (2006.01); B01D 53/30 (2006.01); B01D 53/68 (2006.01); B01D 53/04 (2006.01);
U.S. Cl.
CPC ...
B01D 53/1456 (2013.01); B01D 53/1493 (2013.01); B01D 53/30 (2013.01); B01D 53/685 (2013.01); B01D 53/04 (2013.01); B01D 2251/108 (2013.01); B01D 2251/304 (2013.01); B01D 2251/306 (2013.01); B01D 2251/404 (2013.01); B01D 2251/408 (2013.01); B01D 2252/10 (2013.01); B01D 2257/2022 (2013.01); B01D 2257/2027 (2013.01); B01D 2257/2047 (2013.01);
Abstract

A method for removing a halogen fluoride in a mixed gas by reacting the mixed gas containing a halogen fluoride including bromine or iodine with a removing agent, wherein the removing agent is a chloride, bromide or iodide of potassium, sodium, magnesium, calcium and barium. Also disclosed is a quantitative analysis method as well as a quantitative analyzer for a gas component contained in a hydrogen fluoride mixed gas, the method characterized by reacting a mixed gas containing a halogen fluoride and another gas component with a removing agent, thereby removing the halogen fluoride in the mixed gas, further removing produced by-products, and quantitatively analyzing a residual gas by a gas chromatograph.


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