The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2023

Filed:

Oct. 31, 2019
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Anuj Pandey, Delhi, IN;

Dong Chen, Singapore, SG;

Kwok-Chuen Tan, Singapore, SG;

Assignee:

KLA CORPORATION, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); H01L 21/66 (2006.01); G06T 7/00 (2017.01); H01L 21/683 (2006.01); G01N 23/20 (2018.01);
U.S. Cl.
CPC ...
H01L 22/34 (2013.01); G01N 23/20 (2013.01); G06T 7/001 (2013.01); G06T 7/0006 (2013.01); H01L 21/6836 (2013.01); H01L 22/12 (2013.01); G01N 23/00 (2013.01); G06T 2207/30148 (2013.01); H01L 2221/68331 (2013.01);
Abstract

Embodiments may include methods, systems, and apparatuses for care area based swath speed for throughput and sensitivity improvement. A method may comprise receiving scan region of a die. The scan region of the die may have a first care area at a controller configured to control an inspection tool, wherein the inspection tool includes a stage having the die disposed thereon. The method may then include scanning a first portion of the scan region at a fast feed rate and the first care area at a slow feed rate. Scanning may include emitting particles in a particle beam toward the die resulting an incidence on the die. Emitting may be performed using a particle emitter. Scanning may then include detecting a portion of particles reflected from the incidence. Detecting may be performed using a detector. Scanning may then include changing a position of the stage relative to the incidence.


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