The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2023

Filed:

Mar. 10, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Bencherki Mebarki, Santa Clara, CA (US);

Joung Joo Lee, San Jose, CA (US);

Yi Xu, San Jose, CA (US);

Yu Lei, Belmont, CA (US);

Xianmin Tang, San Jose, CA (US);

Kelvin Chan, San Ramon, CA (US);

Alexander Jansen, San Jose, CA (US);

Philip A. Kraus, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/30 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0206 (2013.01); H01L 21/02068 (2013.01); H01L 21/3003 (2013.01);
Abstract

Method for selectively oxidizing the dielectric surface of a substrate surface comprising a dielectric surface and a metal surface are discussed. Method for cleaning a substrate surface comprising a dielectric surface and a metal surface are also discussed. The disclosed methods oxidize the dielectric surface and/or clean the substrate surface using a plasma generated from hydrogen gas and oxygen gas. The disclosed method may be performed in a single step without the use of separate competing oxidation and reduction reactions. The disclosed methods may be performed at a constant temperature and/or within a single processing chamber.


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