The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2023

Filed:

Apr. 07, 2020
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Nirupam Banerjee, Eindhoven, NL;

Johan Franciscus Maria Beckers, Veldhoven, NL;

Peter Brakhage, Dresden, DE;

Arend Johannes Donkerbroek, Aarle-Rixtel, NL;

Daniel Grimm, Dresden, DE;

Tim Rathje, Jena, DE;

Martin Tilke, Steina, DE;

Sandro Wricke, Nuenen, NL;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); C23C 14/34 (2006.01); C23C 14/58 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7085 (2013.01); C23C 14/34 (2013.01); C23C 14/5826 (2013.01); C23C 16/45525 (2013.01); G03F 7/70341 (2013.01);
Abstract

An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.


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