The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2023
Filed:
Jan. 27, 2020
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Herman Philip Godfried, Amsterdam, NL;
Wilhelmus Patrick Elisabeth Maria Op 'T Root, Nederweert, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01J 3/45 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7085 (2013.01); G01J 3/45 (2013.01); G03F 7/70558 (2013.01); G03F 7/70575 (2013.01);
Abstract
A radiation measurement system () comprising an optical apparatus () configured to receive a radiation beam () and change an intensity distribution of the radiation beam to output a conditioned radiation beam (), and a spectrometer () operable to receive the conditioned radiation beam and determine spectral content of the conditioned radiation beam. The radiation measurement system may form part of a lithographic apparatus.