The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2023
Filed:
Jul. 24, 2020
Asml Netherlands B.v., Veldhoven, NL;
Thijs Adriaan Cornelis Van Keulen, Eindhoven, NL;
Hendrikus Herman Marie Cox, Eindhoven, NL;
Ramidin Izair Kamidi, Eindhoven, NL;
Willem Herman Gertruda Anna Koenen, Roermond, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of determining a desired relative position between a first object of a lithographic apparatus and a second object of the lithographic apparatus. Generating a measurement signal representing a position of the first object relative to the second object, at an initial relative position. Determining a gradient associated with the initial relative position, based on the measurement signal. Determining a position set point based on the gradient and wherein the position set point comprises a three-dimensional dither signal. Controlling the position of the first object relative to the second object to a further relative position, based on the position set point.