The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2023

Filed:

Dec. 27, 2022
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Jing Su, Fremont, CA (US);

Yen-Wen Lu, Saratoga, CA (US);

Ya Luo, Saratoga, CA (US);

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01); G06N 20/00 (2019.01); G06N 5/047 (2023.01);
U.S. Cl.
CPC ...
G03F 7/70441 (2013.01); G03F 7/705 (2013.01); G06N 5/047 (2013.01); G06N 20/00 (2019.01);
Abstract

A method including: obtaining data based an optical proximity correction for a spatially shifted version of a training design pattern; and training a machine learning model configured to predict optical proximity corrections for design patterns using data regarding the training design pattern and the data based on the optical proximity correction for the spatially shifted version of the training design pattern.


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