The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2023

Filed:

Dec. 16, 2021
Applicant:

Globalwafers Co., Ltd., Hsinchu, TW;

Inventors:

Matteo Pannocchia, Lana, IT;

Francesca Marchese, Merano, IT;

James Ho Wai Kitt, Lana, IT;

Assignee:

GlobalWafers Co., Ltd., Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 15/00 (2006.01); C30B 15/12 (2006.01); C30B 15/20 (2006.01); C30B 29/06 (2006.01);
U.S. Cl.
CPC ...
C30B 15/002 (2013.01); C30B 15/12 (2013.01); C30B 15/20 (2013.01); C30B 29/06 (2013.01);
Abstract

Methods for producing single crystal silicon ingots by Continuous Czochralski (CCz) are disclosed. A batch of buffer members (e.g., quartz cullets) is added to an outer melt zone of the crucible assembly before the main body of the ingot is grown. In some embodiments, the ratio of the mass M of the batch of buffer members added to the melt to the time between adding the batch of buffer members to the melt and when the ingot main body begins to grow is controlled such that the ratio of M/T is greater than a threshold M/T.


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