The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2023

Filed:

Dec. 19, 2019
Applicant:

Carl Zeiss Microscopy Gmbh, Jena, DE;

Inventor:

Andreas Schmaunz, Oberkochen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01J 37/145 (2006.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01); H01J 37/304 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); H01J 37/145 (2013.01); H01J 37/244 (2013.01); H01J 37/28 (2013.01); H01J 37/304 (2013.01); H01J 2237/006 (2013.01); H01J 2237/2065 (2013.01);
Abstract

A gas feed device is operated, including displaying a functional parameter of the gas feed device. A gas feed device may carry out the operation, and a particle beam apparatus may include the gas feed device. A method may include predetermining and/or measuring a current temperature of a precursor reservoir of the gas feed device using a temperature measuring unit, where the precursor reservoir contains a precursor to be fed onto an object, loading a flow rate of the precursor through an outlet of the precursor reservoir from a database into a control unit, said flow rate being associated with the current temperature of the precursor reservoir, and (i) displaying the flow rate on the display unit and/or (ii) determining the functional parameter of the precursor reservoir depending on the flow rate using the control unit and informing a user of the gas feed device about the determined functional parameter.


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