The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2023

Filed:

Mar. 15, 2021
Applicant:

Bruker Technologies Ltd., Migdal HaEmek, IL;

Inventors:

Adam Ginsburg, Netanya, IL;

Mark James Vermeulen, Durham, GB;

Paul Anthony Ryan, Darligton, GB;

Matthew Wormington, Highlands Ranch, CO (US);

Assignee:

BRUKER TECHNOLOGIES LTD., Migdal HaEmek, IL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/201 (2018.01); G01N 23/2055 (2018.01);
U.S. Cl.
CPC ...
G01N 23/201 (2013.01); G01N 23/2055 (2013.01); G01N 2223/054 (2013.01); G01N 2223/056 (2013.01); G01N 2223/6116 (2013.01);
Abstract

A method for X-ray measurement includes generating and directing an X-ray beam to a sample including at least first and second layers stacked on one another, the X-ray beam incident on a sample location at which the first and second layers include respective first and second high aspect ratio (HAR) structures. X-ray scatter profiles are measured, that are emitted from the sample location in response to the X-ray beam as a function of tilt angle between the sample and the X-ray beam. A shift is estimated, between the first and second layers and a characteristic tilt of the first and second layers, based on the X-ray scatter profiles measured as a function of the tilt angle.


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