The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2023
Filed:
Jul. 06, 2022
Inpria Corporation, Corvallis, OR (US);
Stephen T. Meyers, Corvallis, OR (US);
Jeremy T. Anderson, Corvallis, OR (US);
Brian J. Cardineau, Corvallis, OR (US);
Joseph B. Edson, Corvallis, OR (US);
Kai Jiang, Corvallis, OR (US);
Douglas A. Keszler, Corvallis, OR (US);
Alan J. Telecky, Albany, OR (US);
Inpria Corporation, Corvallis, OR (US);
Abstract
Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.