The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2023
Filed:
Jun. 04, 2020
Carl Zeiss Microscopy Gmbh, Jena, DE;
Thomas Egloff, Jena, DE;
Ralph Lange, Jena, DE;
Alexander Scheps, Adelebsen, DE;
Johannes Winterot, Jena, DE;
CARL ZEISS MICROSCOPY GMBH, Jena, DE;
Abstract
The invention relates to an optical arrangement and a method for correcting centration errors and/or angle errors in a beam path. The beam path here comprises an optical compensated system in which at least two optical elements are present and aligned relative to one another such that imaging aberrations of the optical elements are compensated. According to the invention, a correction unit is arranged in an infinity space of the beam path and between the at least two optical elements, wherein the correction unit changes the propagation direction of radiation propagating along the beam path and the correction unit either has a reflective surface or is embodied to be transmissive for the radiation. The correction unit is movable such that the angle of a change in the propagation direction can be set.