The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2023
Filed:
Sep. 06, 2018
Applicant:
Fujimi Incorporated, Kiyosu, JP;
Inventors:
Yoshihiro Izawa, Kiyosu, JP;
Kenta Ide, Kiyosu, JP;
Assignee:
FUJIMI INCORPORATED, Kiyosu, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/321 (2006.01); C09G 1/16 (2006.01); C09G 1/02 (2006.01); C09K 3/14 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3212 (2013.01); C09G 1/02 (2013.01); C09G 1/16 (2013.01); C09K 3/1463 (2013.01); H01L 21/31053 (2013.01);
Abstract
A polishing method according to the present invention, includes polishing a polishing object containing a silicon material by using a polishing composition containing abrasive grains, a tri- or more polyvalent hydroxy compound and a dispersing medium and having pH of less than 6.0.
Quick Actions:
Izawa, Yoshihiro. (2023). Polishing method, and polishing composition and method for producing the same (U.S. Patent No. 11749531). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11749531
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile