The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2023
Filed:
Sep. 08, 2021
Applicant:
Nissin Ion Equipment Co., Ltd., Koka, JP;
Inventors:
Jian Wang, Koka, JP;
Shinsuke Inoue, Koka, JP;
Yuta Iwanami, Koka, JP;
Takashi Sakamoto, Koka, JP;
Weijiang Zhao, Koka, JP;
Assignee:
NISSIN ION EQUIPMENT CO., LTD., Koka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/317 (2006.01); H01J 37/304 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3171 (2013.01); H01J 37/20 (2013.01); H01J 37/304 (2013.01); H01J 2237/31706 (2013.01);
Abstract
An ion implantation apparatus includes a transfer device that transfers a wafer, a support device that supports the wafer at an implantation position, and a control device that controls the ion implantation apparatus to perform chain implantation processing on the wafer, and that controls the transfer device or the support device according to warpage information of the wafer.