The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2023

Filed:

Sep. 13, 2021
Applicant:

Macronix International Co., Ltd., Hsinchu, TW;

Inventors:

Shuo-Lun Tu, Hsinchu, TW;

Shyi-Yuan Wu, Hsin-Chu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/40 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7823 (2013.01); H01L 29/0607 (2013.01); H01L 29/401 (2013.01); H01L 29/402 (2013.01); H01L 29/66681 (2013.01);
Abstract

A semiconductor device includes: a substrate; a source region and a drain region located in the substrate; a gate structure located in the substrate between the source region and the drain region; an insulating layer located between the gate structure and the drain region; a plurality of field plates located on the insulating layer, wherein the field plate closest to the gate structure is electrically connected to the source region; a first well region located in the substrate; a body contact region located in the first well region, wherein the body contact region is electrically connected to the source region and the field plate closest to the gate structure; and a first doped drift region located in the substrate, wherein the gate structure is located between the first well region and the first doped drift region, and the drain region is located in the first doped drift region.


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