The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2023
Filed:
Feb. 21, 2019
L'air Liquide, Société Anonyme Pour L'etude ET L'exploitation Des Procédés Georges Claude, Paris, FR;
American Air Liquide, Inc., Fremont, CA (US);
Antonio Sanchez, Tsukuba, JP;
Gennadiy Itov, Flemington, NJ (US);
Manish Khandelwal, Somerset, NJ (US);
Cole Ritter, Easton, PA (US);
Peng Zhang, Branchburg, NJ (US);
Jean-Marc Girard, Versailles, FR;
Zhiwen Wan, Plano, TX (US);
Glenn Kuchenbeiser, Fremont, CA (US);
David Orban, Hampton, NJ (US);
Sean Kerrigan, Princeton, NJ (US);
Reno Pesaresi, Easton, PA (US);
Matthew Damien Stephens, Morristown, NJ (US);
Yang Wang, Garnet Valley, PA (US);
Guillaume Husson, Newark, DE (US);
Grigory Nikiforov, Bridgewater, NJ (US);
L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude, Paris, FR;
American Air Liquide, Inc., Fremont, CA (US);
Abstract
A Si-containing film forming composition comprising a catalyst and/or a polysilane and a N—H free, C-free, and Si-rich perhydropolysilazane having a molecular weight ranging from approximately 332 dalton to approximately 100,000 dalton and comprising N—H free repeating units having the formula [—N(SiH3)x(SiH2-)y], wherein x=0, 1, or 2 and y=0, 1, or 2 with x+y=2; and x=0, 1 or 2 and y=1, 2, or 3 with x+y=3. Also disclosed are synthesis methods and applications for using the same.