The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2023

Filed:

Dec. 20, 2021
Applicant:

Kioxia Corporation, Tokyo, JP;

Inventors:

Harumi Seki, Kawasaki, JP;

Kensuke Ota, Yokohama, JP;

Masumi Saitoh, Yokkaichi, JP;

Assignee:

Kioxia Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 51/30 (2023.01); H01L 29/51 (2006.01); H10B 51/20 (2023.01); H10B 43/30 (2023.01); H10B 43/20 (2023.01); H01L 29/792 (2006.01);
U.S. Cl.
CPC ...
H10B 51/30 (2023.02); H01L 29/516 (2013.01); H01L 29/792 (2013.01); H10B 43/20 (2023.02); H10B 43/30 (2023.02); H10B 51/20 (2023.02);
Abstract

A semiconductor memory device according to an embodiment includes: a semiconductor layer extending in a first direction; a first gate electrode layer; a first insulating layer between the semiconductor layer and the first gate electrode layer; a second insulating layer between the first insulating layer and the first gate electrode layer, the second insulating layer having a first portion containing a ferroelectric material; and a first layer between the first insulating layer and the second insulating layer, the first layer containing silicon, nitrogen, and fluorine, the first layer having a first region and a second region between the first region and the second insulating layer, the first layer having a second atomic ratio of nitrogen to silicon in the second region higher than a first atomic ratio of nitrogen to silicon in the first region, and the first layer having fluorine concentration higher than the second region.


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