The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2023

Filed:

May. 16, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Ludovic Godet, Sunnyvale, CA (US);

Wayne Mcmillan, San Jose, CA (US);

Rutger Meyer Timmerman Thijssen, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/09 (2006.01); G02B 5/18 (2006.01); G03F 1/80 (2012.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0944 (2013.01); G02B 5/18 (2013.01); G02B 5/1857 (2013.01); G03F 1/80 (2013.01); G03F 7/0002 (2013.01);
Abstract

The systems and methods discussed herein are for the fabrication of diffraction gratings, such as those gratings used in waveguide combiners. The waveguide combiners discussed herein are fabricated using nanoimprint lithography (NIL) of high-index and low-index materials in combination with and directional etching high-index and low-index materials. The waveguide combiners can be additionally or alternatively formed by the directional etching of transparent substrates. The waveguide combiners that include diffraction gratings discussed herein can be formed directly on permanent transparent substrates. In other examples, the diffraction gratings can be formed on temporary substrates and transferred to a permanent, transparent substrate.


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