The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2023

Filed:

May. 07, 2021
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Mitsuhiro Shamoto, Tokyo, JP;

Masashi Shimoyama, Tokyo, JP;

Shao Hua Chang, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 17/00 (2006.01); C25D 3/02 (2006.01); C25D 17/14 (2006.01); C25D 21/12 (2006.01);
U.S. Cl.
CPC ...
C25D 17/001 (2013.01); C25D 3/02 (2013.01); C25D 17/008 (2013.01); C25D 17/14 (2013.01); C25D 21/12 (2013.01);
Abstract

Provided is a plate that is arranged between a substrate and an anode in a plating tank. This plate has a plurality of circular pores on each one of at least three reference circles that are concentric with each other and that are different from each other in diameter. The plurality of circular pores include three circular pores that are arranged respectively on adjacent three of the at least three reference circles, and that have centers which are out of alignment with each other on an arbitrary radius on the plate.


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