The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2023

Filed:

Jun. 03, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Philip Allan Kraus, San Jose, CA (US);

Thai Cheng Chua, Cupertino, CA (US);

Mani Subramani, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01J 27/18 (2006.01); H05H 1/46 (2006.01); C23C 16/511 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32678 (2013.01); C23C 14/357 (2013.01); C23C 16/511 (2013.01); H01J 27/18 (2013.01); H01J 37/3222 (2013.01); H01J 37/32192 (2013.01); H01J 37/32201 (2013.01); H01J 37/32238 (2013.01); H01J 37/32247 (2013.01); H01J 37/32266 (2013.01); H01J 37/32669 (2013.01); H01J 37/32935 (2013.01); H05H 1/46 (2013.01);
Abstract

Embodiments include methods and apparatuses that include a plasma processing tool that includes a plurality of magnets. In one embodiment, a plasma processing tool may comprise a processing chamber and a plurality of modular microwave sources coupled to the processing chamber. In an embodiment, the plurality of modular microwave sources includes an array of applicators positioned over a dielectric plate that forms a portion of an outer wall of the processing chamber, and an array of microwave amplification modules. In an embodiment, each microwave amplification module is coupled to one or more of the applicators in the array of applicators. In an embodiment, the plasma processing tool may include a plurality of magnets. In an embodiment, the magnets are positioned around one or more of the applicators.


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