The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2023

Filed:

Jan. 11, 2019
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Takeshi Itatani, Nirasaki, JP;

Hideaki Yamasaki, Nirasaki, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/458 (2006.01); C23C 16/455 (2006.01); H01J 37/32 (2006.01); H01L 21/02 (2006.01); H01L 21/285 (2006.01); C23C 16/34 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4404 (2013.01); C23C 16/34 (2013.01); C23C 16/455 (2013.01); C23C 16/4581 (2013.01); C23C 16/45523 (2013.01); H01J 37/3244 (2013.01); H01J 37/32449 (2013.01); H01J 37/32559 (2013.01); H01L 21/02186 (2013.01); H01L 21/02274 (2013.01); H01L 21/28556 (2013.01);
Abstract

A method of pre-coating an inner surface of a chamber, which includes a surface of a substrate-supporting support base installed in an internal space in the chamber, includes: forming a first film on the inner surface by supplying a first gas; forming a second film on the first film by supplying a second gas; and forming a third film on the second film by supplying a third gas, wherein a flow rate ratio of a hydrogen-containing gas to a metal source gas in the first gas is set to be higher than flow rate ratios of the hydrogen-containing gas to the metal source gas in the second gas and the third gas, and wherein the flow rate of the metal source gas in the first gas is set to be lower than the flow rates of the metal source gas in the second gas and the third gas.


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