The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2023

Filed:

Aug. 04, 2021
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Gildardo Delgado, Livermore, CA (US);

Vera (Guorong) Zhuang, San Jose, CA (US);

John Savee, San Francisco, CA (US);

Evgeniia Butaeva, San Jose, CA (US);

Gary V. Lopez Lopez, Sunnyvale, CA (US);

Grace Chen, Los Gatos, CA (US);

Assignee:

KLA CORPORATION, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/305 (2006.01); H01J 37/20 (2006.01); H01J 37/08 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3053 (2013.01); H01J 37/08 (2013.01); H01J 37/20 (2013.01); H01J 2237/3151 (2013.01); H01J 2237/3174 (2013.01);
Abstract

A material recovery system for an optical component includes a reservoir containing gas and configured to supply a gas flow containing the gas. The material recovery system also includes an ion beam generator disposed on the reservoir and configured to receive the gas flow and to ionize the gas in the gas flow to generate an ion beam. The ion beam is configured to be directed to the optical component to remove at least a portion of a F-containing optical material degraded by exposure to VUV radiation, DUV radiation, and/or photo-contamination.


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