The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2023

Filed:

May. 20, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Mahantesh Hanchinal, Hsinchu, TW;

Shu-Yi Ying, Hsinchu, TW;

Chi Wei Hu, Hsinchu, TW;

Min-Yuan Tsai, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/392 (2020.01); G06F 30/398 (2020.01); G06F 30/3953 (2020.01); G06F 30/3947 (2020.01); G03F 1/36 (2012.01); H01L 21/027 (2006.01); H01L 21/768 (2006.01); H01L 21/76 (2006.01); G06F 119/18 (2020.01);
U.S. Cl.
CPC ...
G06F 30/392 (2020.01); G03F 1/36 (2013.01); G06F 30/398 (2020.01); H01L 21/027 (2013.01); H01L 21/76895 (2013.01); G06F 30/3947 (2020.01); G06F 30/3953 (2020.01); G06F 2119/18 (2020.01); Y02P 90/02 (2015.11);
Abstract

A method of manufacturing an integrated circuit includes adjusting a first spacing between an adjacent pair of routing tracks in a first set of routing tracks to be equal to a second spacing, adjusting a third spacing between an adjacent pair of routing tracks in a second set of routing tracks to be equal to a fourth spacing, placing a first and second pair of conductive patterns on the corresponding first and second set of routing tracks, forming a first set of conductive structures based on the first pair of conductive patterns, and a second set of conductive structures based on the second pair of conductive patterns. A first and second cell have a same cell height that is a non-integer multiple of a minimum pitch. One spacing of a first set of spacings is different from another spacing of the first set of spacings.


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