The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2023
Filed:
Jun. 30, 2021
Asml Netherlands B.v., Veldhoven, NL;
Alexander Ypma, Veldhoven, NL;
Cyrus Emil Tabery, San Jose, CA (US);
Simon Hendrik Celine Van Gorp, Oud-Turnhout, BE;
Chenxi Lin, Newark, CA (US);
Dag Sonntag, Eindhoven, NL;
Hakki Ergün Cekli, Singapore, SG;
Ruben Alvarez Sanchez, Veldhoven, NL;
Shih-Chin Liu, Eindhoven, NL;
Simon Philip Spencer Hastings, San Jose, CA (US);
Boris Menchtchikov, Redwood City, CA (US);
Christiaan Theodoor De Ruiter, Eindhoven, NL;
Peter Ten Berge, Eindhoven, NL;
Michael James Lercel, Fishkill, NY (US);
Wei Duan, Eindhoven, NL;
Pierre-Yves Jerome Yvan Guittet, Veldhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method and associated computer program for predicting an electrical characteristic of a substrate subject to a process. The method includes determining a sensitivity of the electrical characteristic to a process characteristic, based on analysis of electrical metrology data including electrical characteristic measurements from previously processed substrates and of process metrology data including measurements of at least one parameter related to the process characteristic measured from the previously processed substrates; obtaining process metrology data related to the substrate describing the at least one parameter; and predicting the electrical characteristic of the substrate based on the sensitivity and the process metrology data.