The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2023
Filed:
Dec. 23, 2019
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Tsukasa Sugawara, Kanagawa, JP;
TOKYO OHKA KOGYO CO., LTD., Kanagawa, JP;
Abstract
To provide a method for producing a porous film in which even when minute fine particles are used, fine particles can be satisfactorily dispersed, a method for producing a composition for producing a porous film, and a porous film that can be produced by the method for producing a porous film. When a porous film is formed using a varnish including at least one resin component selected from the group consisting of polyamide acid, polyimide, a polyamide-imide precursor, polyamide-imide and polyethersulfone, and fine particles, varnish is produced by dispersing the fine particles by using a pressure device that pressurizes slurry including the fine particles and a dispersing device provided with a flow path whose cross-sectional area is 1960 μmor more and 785000 μmor less, and allowing the slurry pressurized to 50 MPa or more to pass through the flow path.