The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 25, 2023

Filed:

Jan. 28, 2022
Applicant:

Jeol Ltd., Tokyo, JP;

Inventors:

Kenichi Tsutsumi, Tokyo, JP;

Tatsuya Uchida, Tokyo, JP;

Assignee:

JEOL Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/244 (2006.01); H01J 37/147 (2006.01); H01J 37/24 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/244 (2013.01); H01J 37/1474 (2013.01); H01J 37/24 (2013.01); H01J 37/28 (2013.01); H01J 2237/0473 (2013.01); H01J 2237/221 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/24475 (2013.01);
Abstract

A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.


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