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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11709428 B1

PDFFull Text
Date of Patent:
Jul. 25, 2023

Filed:

Mar. 05, 2021

Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compound

Applicant:

Jsr Corporation, Tokyo, JP;

Inventor:

Natsuko Kinoshita, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Element IP, PLC

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/30 (2006.01); C08F 212/00 (2006.01); C08F 220/14 (2006.01); G03F 7/004 (2006.01); C08F 220/22 (2006.01); C08F 220/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C08F 212/00 (2013.01); C08F 220/14 (2013.01); C08F 220/16 (2013.01); C08F 220/22 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/30 (2013.01);
Abstract

A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one Ris an acid-dissociable group; and Ris a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of Rand Ris a fluorine atom or a fluoroalkyl group; Ris a monovalent organic group having a cyclic structure; Xis a monovalent onium cation; Ris a monovalent organic group, and Xis a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure.

Find Patent Forward Citations

Kinoshita, Natsuko. (2023). Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compound (U.S. Patent No. 11709428). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11709428

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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