The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 25, 2023

Filed:

Mar. 16, 2020
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Ken-ichiro Shinoda, Utsunomiya, JP;

Tooru Kawashima, Shioya-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 9/00 (2006.01); B29C 33/42 (2006.01); B29C 59/02 (2006.01); G02B 5/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 33/424 (2013.01); G03F 7/70633 (2013.01); G03F 7/70683 (2013.01); G03F 9/7042 (2013.01); G03F 9/7088 (2013.01); B29C 2033/426 (2013.01); B29C 2059/023 (2013.01); G02B 5/005 (2013.01); G03F 7/70775 (2013.01); G03F 9/7065 (2013.01); G03F 9/7069 (2013.01); G03F 9/7073 (2013.01); G03F 9/7084 (2013.01);
Abstract

An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold having a mesa including a pattern region where a pattern and a mark are formed. The apparatus includes an alignment optical system which includes an illumination system configured to illuminate the mark with illumination light and a detecting system configured to detect an image of the mark illuminated by the illumination system. The illumination system includes a limiter configured to limit incidence of the illumination light to a side of the mesa, a ridge line of the mesa, and an outer region of the side.


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