The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2023

Filed:

May. 12, 2020
Applicant:

Skyworks Solutions, Inc., Woburn, MA (US);

Inventors:

Yun Shi, San Diego, CA (US);

John Tzung-Yin Lee, Costa Mesa, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/78 (2006.01); H01L 29/10 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0696 (2013.01); H01L 29/1095 (2013.01); H01L 29/4238 (2013.01); H01L 29/7841 (2013.01);
Abstract

Transistors having reduced parasitics and enhanced performance. In some embodiments, a transistor can include a source and a drain each implemented as a first type active region, and a gate implemented relative to the source and the drain such that application of a voltage to the gate results in formation of a conductive channel between the source and the drain. The transistor can further include a body configured to provide the conductive channel upon the application of the voltage to the gate. The body can be implemented as a second type active region that butts with the first type active region on the source side at a respective area not covered by the gate, and does not butt with the first type active region on the drain side at a respective area not covered by the gate.


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