The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2023

Filed:

Mar. 10, 2020
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Alisia Mariska Willems-Peters, Eindhoven, NL;

Sander Baltussen, Castenray, NL;

Zhuangxiong Huang, Eindhoven, NL;

Reinier Theodorus Martinus Jilisen, Eindhoven, NL;

Sietse Wijtvliet, Apeldoorn, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70775 (2013.01); G03F 7/70916 (2013.01); G03F 7/70933 (2013.01);
Abstract

An apparatus comprising: a position monitoring system configured to determine the position of the substrate with respect to a projection system configured to project a radiation beam through an opening in the projection system and onto a substrate, wherein a component of the position monitoring system is located beneath the projection system in use; and a baffle disposed between the opening and the component.


Find Patent Forward Citations

Willems-Peters, Alisia. (2023). Lithographic apparatus and related methods (U.S. Patent No. 11703768). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11703768

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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