The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2023

Filed:

Nov. 16, 2020
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Yu Ishii, Tokyo, JP;

Hirotaka Satori, Tokyo, JP;

Makoto Kashiwagi, Tokyo, JP;

Manato Furusawa, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 37/32 (2012.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
B24B 37/32 (2013.01); H01L 21/6838 (2013.01);
Abstract

Provided is a top ring that ensures uniformly pressing a substrate against a polishing pad. A top ringfor holding a substrate WF includes a base membercoupled to a top ring shaft, an elastic filmthat is mounted to the base memberand forms a pressurization chamberfor pressurizing the substrate WF between the base memberand the elastic film, a substrate suction memberthat includes a porous memberincluding a substrate suction surfacefor suctioning the substrate WF and a pressure reducing portioncommunicating with a pressure reducing unit. The substrate suction memberis held to the elastic film


Find Patent Forward Citations

Loading…