The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2023
Filed:
Mar. 13, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Boguslaw A. Swedek, Cupertino, CA (US);
Dominic J. Benvegnu, La Honda, CA (US);
Chih Chung Chou, San Jose, CA (US);
Nicholas Wiswell, Sunnyvale, CA (US);
Thomas H. Osterheld, Mountain View, CA (US);
Jeonghoon Oh, Saratoga, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 37/04 (2012.01); B24B 49/12 (2006.01); H01L 21/66 (2006.01); B24B 37/013 (2012.01);
U.S. Cl.
CPC ...
B24B 37/013 (2013.01); B24B 37/04 (2013.01); B24B 49/12 (2013.01); H01L 22/12 (2013.01); H01L 22/26 (2013.01);
Abstract
A chemical mechanical polishing apparatus includes a platen to support a polishing pad, the platen having a recess, a flexible membrane in the recess, and an in-situ vibration monitoring system to generate a signal. The in-situ acoustic monitoring system includes a vibration sensor supported by the flexible membrane and positioned to couple to an underside of the polishing pad.