The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2023
Filed:
Feb. 07, 2022
Applied Materials, Inc., Santa Clara, CA (US);
Supakit Charnvanichborikarn, Gloucester, MA (US);
Wei Zou, Lexington, MA (US);
Hans-Joachim L. Gossmann, Summit, NJ (US);
Qintao Zhang, Mt Kisco, NY (US);
Aseem Kumar Srivastava, Andover, MA (US);
William Robert Bogiages, Jr., Danvers, MA (US);
Wei Zhao, Lexington, MA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of performing an ion implantation process using a beam-line ion implanter, including disposing a substrate on a platen, analyzing the substrate using metrology components, communicating data relating to the analysis of the substrate to a feedforward controller, processing the data using a predictive model executed by the feedforward controller to compensate for variations in the substrate and to compensate for variations in components of the beam-line ion implanter based on historical data collected from previous implantation operations, and using output from the predictive model to adjust operational parameters of the beam-line ion implanter.