The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 2023

Filed:

Mar. 29, 2021
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Atsushi Sawachi, Miyagi, JP;

Norihiko Amikura, Miyagi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01J 37/32 (2006.01); G05D 7/06 (2006.01); G05D 11/13 (2006.01); C23C 16/52 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
G05D 7/0664 (2013.01); C23C 16/45561 (2013.01); C23C 16/45565 (2013.01); C23C 16/45574 (2013.01); C23C 16/52 (2013.01); G05D 7/0641 (2013.01); G05D 11/132 (2013.01); H01J 37/3244 (2013.01); H01J 37/32449 (2013.01); C23C 16/4412 (2013.01);
Abstract

A gas supply system includes a first flow channel connected to a first gas source of a first gas, formed inside a ceiling or a sidewall of the treatment container, and communicating with the treatment space through a plurality of first gas discharge holes, a second flow channel connected to a second gas source of a second gas, formed inside the ceiling or the sidewall of the treatment container, and communicating with the treatment space through a plurality of second gas discharge holes, and a plurality of first diaphragm valves, wherein each of the first diaphragm valves is provided between the first flow channel and the first gas discharge hole to correspond to the first gas discharge hole.


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