The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2023

Filed:

Dec. 08, 2020
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Adam Faust, Rehovot, IL;

Yosef Basson, Mazkeret-Batya, IL;

Guy Eytan, Kidron, IL;

Yonathan David, Yavne, IL;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01L 21/683 (2006.01); H01L 21/67 (2006.01); G01N 27/04 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); G01N 27/041 (2013.01); H01J 37/28 (2013.01); H01L 21/67259 (2013.01); H01L 21/6831 (2013.01);
Abstract

A method, a non-transitory computer readable medium and a device. The method may include (a) introducing a voltage difference between an absolute value of a negative pole of the electrostatic chuck and an absolute value of a positive pole of the electrostatic chuck, the introducing occurs while the wafer is supported by the electrostatic chuck and is contacted by one or more conductive contact pins of the electrostatic chuck; (b) monitoring, by an electrostatic sensor that comprises a sensing element, a charge at a point of measurement located at a front side of the wafer, at different points of time that follow a start of the introducing of the voltage difference, to provide monitoring results; and (c) determining an electrical parameter of the contact between the wafer and the electrostatic chuck, based on the monitoring results.


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