The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2023
Filed:
Jan. 08, 2019
Asml Netherlands B.v., Veldhoven, NL;
Nitish Kumar, Eindhoven, NL;
Richard Quintanilha, Heidenheim an der Brenz, DE;
Markus Gerardus Martinus Maria Van Kraaij, Eindhoven, NL;
Konstantin Tsigutkin, Eindhoven, NL;
Willem Marie Julia Marcel Coene, Geldrop, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.