The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2023

Filed:

Jan. 27, 2021
Applicant:

Macronix International Co., Ltd., Hsinchu, TW;

Inventors:

Chung Yi Lin, Hsinchu County, TW;

Chih-Hsiung Lee, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H10B 43/27 (2023.01); H10B 43/10 (2023.01); H10B 43/30 (2023.01);
U.S. Cl.
CPC ...
H10B 43/27 (2023.02); H10B 43/10 (2023.02); H10B 43/30 (2023.02);
Abstract

Provided are a three-dimensional (3D) memory device and a manufacturing method thereof. The 3D memory device includes a gate stacked structure, a channel layer, a charge storage structure, an electrode layer and a capacitor dielectric layer. The gate stacked structure is disposed on a substrate and includes a plurality of gate layers electrically insulated from each other. The gate stacked structure has at least one channel hole and at least one capacitor trench. The channel layer is disposed on the sidewall of the at least one channel hole. The charge storage structure is disposed between the channel layer and the sidewall of the at least one channel hole. The electrode layer is disposed on the sidewall of the at least one capacitor trench. The capacitor dielectric layer is disposed between the electrode layer and the sidewall of the at least one capacitor trench.


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