The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2023
Filed:
Oct. 25, 2019
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Bob Rollinger, San Diego, CA (US);
Georgiy Olegovich Vaschenko, San Diego, CA (US);
Chirag Rajyaguru, San Diego, CA (US);
Alexander Igorevich Ershov, Escondido, CA (US);
Joshua Mark Lukens, San Diego, CA (US);
Mathew Cheeran Abraham, San Diego, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
H05G 2/006 (2013.01);
Abstract
Disclosed is a system for generating EUV radiation in which current flowing through target material in the orificeof a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.