The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2023

Filed:

Dec. 24, 2019
Applicant:

Camtek Ltd., Migdal-Haemek, IL;

Inventor:

Zehava Ben Ezer, Balfuria, IL;

Assignee:

CAMTEK LTD., Migdal-Haemek, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 23/488 (2006.01); H01L 21/22 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76898 (2013.01); H01L 21/22 (2013.01); H01L 22/12 (2013.01); H01L 22/24 (2013.01); H01L 23/488 (2013.01);
Abstract

There may be provided a method for inspecting a top redistribution layer conductors of an object. The top redistribution layer (RDL) is positioned above at least one lower RDL and above at least one other dielectric layer. The method may include (i) illuminating the object with radiation, the at least one lower dielectric layer significantly absorbs the radiation; (ii) generating, by a detector, detection signals that represent radiation reflected from the object, and (iii) processing, by a processor, the detection signal to provide information about the top RDL. The processing may include distinguishing detection signals related to the top RDL from detection signals related to the at least one lower RDL.


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