The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2023
Filed:
May. 07, 2021
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Joji Takayoshi, Miyagi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32642 (2013.01); H01J 37/32174 (2013.01); H01J 2237/334 (2013.01);
Abstract
A plasma processing method is provided. In the plasma processing method, plasma is generated inside a chamber. A DC voltage is applied to an edge ring disposed to surround a substrate while generating the plasma. A first voltage of the edge ring is acquired while applying the DC voltage. Then, the application of the DC voltage is stopped. A second voltage of the edge ring is acquired while stopping the application of the DC voltage. Then, a parameter for controlling the DC voltage is calculated based on the first voltage and the second voltage.