The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2023
Filed:
Mar. 16, 2021
Hitachi High-tech Science Corporation, Tokyo, JP;
Koji Nagahara, Tokyo, JP;
Yuichi Madokoro, Tokyo, JP;
HITACHI HIGH-TECH SCIENCE CORPORATION, Tokyo, JP;
Abstract
Provided is a particle beam apparatus capable of performing appropriate switching selectively between charged particle beam and neutral particle beam. A particle beam column () includes an ion source (), a condenser lens (), a charge exchange grid (), and an objective lens (). The ion source () generates ions. The condenser lens () changes focusing of the ion beam so that switching is performed between ion beam and neutral beam as particle beam with which a sample (S) is irradiated. The charge exchange grid () converts at least a part of ion beam into neutral particle beam through neutralization. The objective lens () is placed downstream of the charge exchange grid (). The objective lens () reduces the ion beam toward the sample (S) when the sample (S) is irradiated with the neutral particle beam as the particle beam.