The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2023

Filed:

Dec. 28, 2020
Applicant:

Sandisk Technologies Llc, Addison, TX (US);

Inventors:

Peter Rabkin, Cupertino, CA (US);

Masaaki Higashitani, Cupertino, CA (US);

Kwang-ho Kim, Pleasanton, CA (US);

Assignee:

SANDISK TECHNOLOGIES LLC, Addison, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 25/065 (2023.01); H01L 23/528 (2006.01); H01L 25/18 (2023.01); H01L 23/00 (2006.01); H01L 25/00 (2006.01); H10B 41/27 (2023.01); H10B 43/27 (2023.01);
U.S. Cl.
CPC ...
H01L 25/18 (2013.01); H01L 23/5286 (2013.01); H01L 24/08 (2013.01); H01L 24/80 (2013.01); H01L 25/0657 (2013.01); H01L 25/50 (2013.01); H10B 41/27 (2023.02); H10B 43/27 (2023.02); H01L 2224/08145 (2013.01); H01L 2224/80006 (2013.01); H01L 2224/80895 (2013.01); H01L 2224/80896 (2013.01); H01L 2924/1431 (2013.01); H01L 2924/14511 (2013.01);
Abstract

A semiconductor structure includes a memory die bonded to a logic die. The memory die includes an alternating stack of insulating layers and electrically conductive layers; memory openings extending through the alternating stack, memory opening fill structures located in the memory openings and comprising a respective vertical semiconductor channel and a respective memory film, a source layer contacting the vertical semiconductor channels, a backside isolation dielectric layer contacting a backside surface of the source layer, and a source power supply mesh including a planar portion of a source-side electrically conductive layer that is located on a backside of the backside isolation dielectric layer and electrically connected to the source layer by conductive material portions that extend through the backside isolation dielectric layer.


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