The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2023

Filed:

Jul. 24, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Kurtis Leschkies, San Jose, CA (US);

Jeffrey L. Franklin, Albuquerque, NM (US);

Wei-Sheng Lei, Santa Clara, CA (US);

Steven Verhaverbeke, San Francisco, CA (US);

Jean Delmas, Santa Clara, CA (US);

Han-Wen Chen, Cupertino, CA (US);

Giback Park, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/48 (2006.01); B23K 26/0622 (2014.01); B23K 26/382 (2014.01); H01L 23/498 (2006.01); H01L 23/31 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67121 (2013.01); B23K 26/0622 (2015.10); B23K 26/382 (2015.10); H01L 21/486 (2013.01); H01L 23/3121 (2013.01); H01L 23/49827 (2013.01);
Abstract

The present disclosure relates to systems and methods for fabricating semiconductor packages, and more particularly, for forming features in semiconductor packages by laser ablation. In one embodiment, the laser systems and methods described herein can be utilized to pattern a substrate to be utilized as a package frame for a semiconductor package having one or more interconnections formed therethrough and/or one or more semiconductor dies disposed therein. The laser systems described herein can produce tunable laser beams for forming features in a substrate or other package structure. Specifically, frequency, pulse width, pulse shape, and pulse energy of laser beams are tunable based on desired sizes of patterned features and on the material in which the patterned features are formed. The adjustability of the laser beams enables rapid and accurate formation of features in semiconductor substrates and packages with controlled depth and topography.


Find Patent Forward Citations

Loading…