The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2023

Filed:

Sep. 13, 2021
Applicant:

Jeol Ltd., Tokyo, JP;

Inventors:

Kazuki Yagi, Tokyo, JP;

Yu Jimbo, Tokyo, JP;

Bryan W. Reed, San Leandro, CA (US);

Ruth Shewmon Bloom, Oakland, CA (US);

Assignee:

JEOL Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/04 (2006.01); H01J 37/147 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/045 (2013.01); H01J 37/1477 (2013.01); H01J 37/244 (2013.01); H01J 2237/24415 (2013.01);
Abstract

A charged particle beam device including: a charged particle beam source which emits a charged particle beam; a blanking device which has an electrostatic deflector that deflects and blocks the charged particle beam; an irradiation optical system which irradiates a specimen with the charged particle beam; and a control unit which controls the electrostatic deflector, the control unit performing processing of: acquiring a target value of a dose of the charged particle beam for the specimen; setting a ratio A/B of a time A during which the charged particle beam is not blocked to a unit time B (where A≠B, A≠0), based on the target value; and operating the electrostatic deflector based on the ratio.


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