The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2023

Filed:

Jun. 07, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Chia-Yang Wu, Tainan, TW;

Shiu-Ko Jangjian, Tainan, TW;

Ting-Chun Wang, Tainan, TW;

Yung-Si Yu, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/417 (2006.01); H01L 29/78 (2006.01); H01L 21/768 (2006.01); H01L 21/762 (2006.01); H01L 21/285 (2006.01); H01L 29/49 (2006.01); H01L 29/165 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66795 (2013.01); H01L 21/28556 (2013.01); H01L 21/762 (2013.01); H01L 21/76831 (2013.01); H01L 21/76832 (2013.01); H01L 21/76843 (2013.01); H01L 29/41791 (2013.01); H01L 29/4966 (2013.01); H01L 29/665 (2013.01); H01L 29/66545 (2013.01); H01L 29/7848 (2013.01); H01L 29/7851 (2013.01); H01L 21/76224 (2013.01); H01L 29/165 (2013.01);
Abstract

A semiconductor device structure is provided. The semiconductor device structure includes a dielectric structure over the substrate. The semiconductor device structure includes a contact structure passing through the dielectric structure. The contact structure includes a contact layer, a first barrier layer, and a second barrier layer. The first barrier layer surrounds the contact layer, the second barrier layer surrounds a first upper portion of the first barrier layer, the contact layer passes through the first barrier layer and extends into the dielectric structure, and the first barrier layer passes through the second barrier layer and extends into the dielectric structure.


Find Patent Forward Citations

Loading…